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Computer Optics, 2016, Volume 40, Issue 2, Pages 215–224 (Mi co135)  

OPTO-IT

Characterization of the surface relief of film diffractive optical elements

T. P. Kaminskaya, V. V. Popov, A. M. Saletskiy

Lomonosov Moscow State University, Moscow, Russia

Abstract: The surface relief of film reflective diffractive optical elements (DOE) has been characterized by atomic force microscopy. The elements under study were fabricated using a variety of microfabrication techniques: traditional laser recoding of reflection rainbow holograms, Dot matrix and Kinemax technologies, and e-beam lithography. The influence of these technologies on the relief characteristics has been estimated. It has been shown that the choice of such technologies is defined by the necessity to obtain corresponding optical characteristics of diffractive optical elements.

Keywords: diffractive optical elements, atomic force microscope, diffraction efficiency, surface-relief parameters.

DOI: https://doi.org/10.18287/2412-6179-2016-40-2-215-224

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Full text: http://www.computeroptics.smr.ru/.../400212.html
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Received: 11.03.2016
Revised: 14.04.2016

Citation: T. P. Kaminskaya, V. V. Popov, A. M. Saletskiy, “Characterization of the surface relief of film diffractive optical elements”, Computer Optics, 40:2 (2016), 215–224

Citation in format AMSBIB
\Bibitem{KamPopSal16}
\by T.~P.~Kaminskaya, V.~V.~Popov, A.~M.~Saletskiy
\paper Characterization of the surface relief of film diffractive optical elements
\jour Computer Optics
\yr 2016
\vol 40
\issue 2
\pages 215--224
\mathnet{http://mi.mathnet.ru/co135}
\crossref{https://doi.org/10.18287/2412-6179-2016-40-2-215-224}


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