Precision laser recording of microstructures on molybdenum films for generating a diffractive microrelief
S. D. Poletayevab, S. G. Volotovskyab
a Samara National Research University, Samara, Russia
b Image Processing Systems Institute îf RAS,– Branch of the FSRC “Crystallography and Photonics” RAS, Samara, Russia
We discuss a problem of reducing the thickness of lines of the contact pattern masks produced by laser ablation of thin films of refractory metals and used when synthesizing the micro-relief of diffractive optical elements (DOEs). For a contact mask for a DOE on molybdenum, patterns with features in the range 0.25-0.3 $µ$m were recorder by laser ablation on 40-nm thick films. This is approximately 3 times smaller than the characteristic dimensions obtained by thermochemical recording chromium films of the same thickness in the standard process. A microrelief of height of up to 300 nm was formed in a quartz substrate by reactive ion etching in an inductively coupled plasma through the mask. We show that thin molybdenum films can have promising applications as metallic masks when synthesizing a DOE microrelief.
diffractive microrelief, metallic mask, laser ablation, thermochemical recording, molybdenum film, reactive ion etching.
|Russian Foundation for Basic Research
|This work was supported by RFBR grant ¹ 14-07-00177, 16-29-09528, 16-29-11744, 16-07-00825.
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S. D. Poletayev, S. G. Volotovsky, “Precision laser recording of microstructures on molybdenum films for generating a diffractive microrelief”, Computer Optics, 40:3 (2016), 422–426
Citation in format AMSBIB
\by S.~D.~Poletayev, S.~G.~Volotovsky
\paper Precision laser recording of microstructures on molybdenum films for generating a diffractive microrelief
\jour Computer Optics
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