RUS  ENG JOURNALS   PEOPLE   ORGANISATIONS   CONFERENCES   SEMINARS   VIDEO LIBRARY   PACKAGE AMSBIB
General information
Latest issue
Archive

Search papers
Search references

RSS
Latest issue
Current issues
Archive issues
What is RSS



Computer Optics:
Year:
Volume:
Issue:
Page:
Find






Personal entry:
Login:
Password:
Save password
Enter
Forgotten password?
Register


Computer Optics, 2016, Volume 40, Issue 4, Pages 482–488 (Mi co242)  

OPTO-IT

Development of methods for formation and testing of photoresist films with a desired thickness profile when fabricating conformal correctors

V. P. Korolkov, A. S. Konchenko, V. V. Cherkashin, N. G. Mironnikov

Institute of Automation and Electrometry SB RAS, Novosibirsk, Russia

Abstract: A process of manufacturing conformal correctors for solid state YAG:Nd3+ lasers is discussed. It is proposed that a maskless lithography method should be used for fabricating a photoresist film with a desired thickness profile as an alternative to the proximity lithography based on half-tone masks. The use of a specular spectral scatterometry method for the testing of the conformal corrector shape at an early stage of photoresist profile formation is reported. A combination of these two methods makes the corrector manufacturing process significantly cheaper and faster.

Keywords: specular spectral scatterometry, maskless lithography, conformal correctors, thin film thickness measurement, profilometry.

DOI: https://doi.org/10.18287/2412-6179-2016-40-4-482-488

Full text: PDF file (612 kB)
Full text: http://www.computeroptics.smr.ru/.../400407.html
References: PDF file   HTML file

Received: 30.05.2016
Accepted:16.08.2016

Citation: V. P. Korolkov, A. S. Konchenko, V. V. Cherkashin, N. G. Mironnikov, “Development of methods for formation and testing of photoresist films with a desired thickness profile when fabricating conformal correctors”, Computer Optics, 40:4 (2016), 482–488

Citation in format AMSBIB
\Bibitem{KorKonChe16}
\by V.~P.~Korolkov, A.~S.~Konchenko, V.~V.~Cherkashin, N.~G.~Mironnikov
\paper Development of methods for formation and testing of photoresist films with a desired thickness profile when fabricating conformal correctors
\jour Computer Optics
\yr 2016
\vol 40
\issue 4
\pages 482--488
\mathnet{http://mi.mathnet.ru/co242}
\crossref{https://doi.org/10.18287/2412-6179-2016-40-4-482-488}


Linking options:
  • http://mi.mathnet.ru/eng/co242
  • http://mi.mathnet.ru/eng/co/v40/i4/p482

    SHARE: VKontakte.ru FaceBook Twitter Mail.ru Livejournal Memori.ru


    Citing articles on Google Scholar: Russian citations, English citations
    Related articles on Google Scholar: Russian articles, English articles
  • Computer Optics
    Number of views:
    This page:83
    Full text:26
    References:18

     
    Contact us:
     Terms of Use  Registration  Logotypes © Steklov Mathematical Institute RAS, 2020