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Computer Optics, 2016, Volume 40, Issue 6, Pages 830–836 (Mi co333)  

OPTO-IT

Etching of silicon dioxide in off-electrode plasma using a chrome mask

V. V. Podlipnovab, V. A. Kolpakova, N. L. Kazanskiiab

a Samara National Research University, Samara, Russia
b Image Processing Systems Institute îf RAS, – Branch of the FSRC “Crystallography and Photonics” RAS, Samara, Russia

Abstract: We discuss results of etching a Cr-SiO$_2$ structure is in a flow of off-electrode gas-discharge plasma in a CF$_4$ + O$_2$ gas at a ratio of 50: 1, at the discharge current I = 80 mA, accelerating voltage U = 1.2 kV, and process duration t = 5 min. It was shown that changes in the intensity of Raman spectral bands in the course of etching correspond to nanoscale changes in the thin Cr-SiO$_2$ films and a chrome mask. The peculiarity of the etching process consists in the removal of the Cr$_2$O$_3$ oxide with increasing amount of nitrogen molecules in the structure of the Cr film. It was found that spray products deposited inside the chrome mask windows at U = 1.2 kV and I = 80 mA are in the form of Cr$_2$N, according to their Raman spectra.

Keywords: diffusion, ion-electron beam, etch, reprecipitation, micromasking.

Funding Agency Grant Number
Ministry of Education and Science of the Russian Federation ÌÄ-5205.2016.9
Russian Foundation for Basic Research 16-07-00494 À
This work was financially supported by the grant of the President of the Russian Federation (project no. MD-5205.2016.9) and the Russian Foundation for Basic Research (grant No. 16-07-00494 À).


DOI: https://doi.org/10.18287/2412-6179-2016-40-6-830-836

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Full text: http://www.computeroptics.smr.ru/.../400608.html
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Received: 28.11.2016
Accepted:07.12.2016

Citation: V. V. Podlipnov, V. A. Kolpakov, N. L. Kazanskii, “Etching of silicon dioxide in off-electrode plasma using a chrome mask”, Computer Optics, 40:6 (2016), 830–836

Citation in format AMSBIB
\Bibitem{PodKolKaz16}
\by V.~V.~Podlipnov, V.~A.~Kolpakov, N.~L.~Kazanskii
\paper Etching of silicon dioxide in off-electrode plasma using a chrome mask
\jour Computer Optics
\yr 2016
\vol 40
\issue 6
\pages 830--836
\mathnet{http://mi.mathnet.ru/co333}
\crossref{https://doi.org/10.18287/2412-6179-2016-40-6-830-836}


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