Surface modification of silica glass by pulses of a picosecond laser
M. A. Zavyalova
Technological Design Institute of Scientific Instrument Engineering,
Siberian Branch of the Russian Academy of Sciences, Novosibirsk, Russia
An experimental laser system for studying the processes of micro– and nanostructure direct formation in a silica glass by picosecond laser pulses is described. A method of ablation monitoring based on the Shack-Hartmann wavefront sensor is proposed. Ablation craters on the surface of the silica glass varying in depth from $23 \pm 4 nm $ to $144 \pm 18 nm $ with good edge quality with the power density varying from $0,57 \times 1012$ to $31 \times 1012$ W/cm$^2$, respectively, are synthesized. Higher-intensity modes of laser processing lead to the formation of cracks and chips on the surface of the material, with lower-intensity processing leading to the appearance of melting edges. The obtained structures are characterized using an atomic force microscope. The ablation rate of the silica glass is established.
laser ablation, nanostructure, a silica glass, picosecond laser pulses, Shack-Hartmann wavefront sensor.
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M. A. Zavyalova, “Surface modification of silica glass by pulses of a picosecond laser”, Computer Optics, 40:6 (2016), 863–870
Citation in format AMSBIB
\paper Surface modification of silica glass by pulses of a picosecond laser
\jour Computer Optics
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