This article is cited in 2 scientific papers (total in 2 papers)
Selfconsistent compensated microfield model for strongly coupled plasma
N. N. Kalitkin, I. A. Kozlitin
Institute for Mathematical Modelling, Russian Academy of Sciences
The compensated microfield model of plasma non-ideality was proposed as the essential improvement of traditional microfield models. In this model double contribution of microfield in truncation of statistical sums was removed. The new method of truncation of statistical sums was compared with experiments, Debye model and other well-known models. It was found that only the microfield model explained experiments correctly. Calculations of Li and Hg ionizations were performed. Metalization of plasma — jump ionization growth process from 0 to 1 in the low temperature and normal density area — is described. Calculation of Hg vapour ionization describes well-known experiments of measurement of conductivity of this vapour.
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Mathematical Models and Computer Simulations, 2009, 1:1, 31–43
N. N. Kalitkin, I. A. Kozlitin, “Selfconsistent compensated microfield model for strongly coupled plasma”, Matem. Mod., 20:1 (2008), 61–76; Math. Models Comput. Simul., 1:1 (2009), 31–43
Citation in format AMSBIB
\by N.~N.~Kalitkin, I.~A.~Kozlitin
\paper Selfconsistent compensated microfield model for strongly coupled plasma
\jour Matem. Mod.
\jour Math. Models Comput. Simul.
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N. N. Kalitkin, I. A. Kozlitin, “Comparison of detailed plasma composition for different models”, Math. Models Comput. Simul., 1:2 (2009), 200–207
I. A. Kozlitin, “The modeling of Holtzmark distribution by the Monte-Carlo method”, Math. Models Comput. Simul., 3:1 (2011), 58–64
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