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Kvantovaya Elektronika, 2013, Volume 43, Number 4, Pages 388–391 (Mi qe15130)  

This article is cited in 1 scientific paper (total in 1 paper)

Extreme light fields and their applications

Freestanding film structures for laser plasma experiments

E. B. Klyuenkov, A. Ya. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin

Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhnii Novgorod

Abstract: The technique is developed for fabricating 5—500-nm-thick freestanding films of various materials and multilayer compositions. Apart from the traditional use in spectral filtration of soft X-ray and extreme ultraviolet radiation, the possibility of using the ultrathin films fabricated by this technique as targets in experiments on laser acceleration of ions is considered. A sample of the target in the form of a 5-nm-thick carbon film on a supporting net is fabricated.

Keywords: freestanding multilayer structure, thin-film laser target, EUV filter.

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English version:
Quantum Electronics, 2013, 43:4, 388–391

Bibliographic databases:

Document Type: Article
PACS: 07.85.Fv, 52.38.Ph, 78.67.-n, 81.07.-b
Received: 24.12.2012

Citation: E. B. Klyuenkov, A. Ya. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, “Freestanding film structures for laser plasma experiments”, Kvantovaya Elektronika, 43:4 (2013), 388–391 [Quantum Electron., 43:4 (2013), 388–391]

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  • http://mi.mathnet.ru/eng/qe15130
  • http://mi.mathnet.ru/eng/qe/v43/i4/p388

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    This publication is cited in the following articles:
    1. I. V. Malyshev, A. E. Pestov, V. N. Polkovnikov, N. N. Salashchenko, M. N. Toropov, N. I. Chkhalo, “Current state of development of a microscope operating at a wavelength of 3.37 nm at the institute of physics of microstructures of the russian academy of sciences”, J. Surf. Ingestig., 12:6 (2018), 1253–1263  crossref  isi  scopus
  • Квантовая электроника Quantum Electronics
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