This article is cited in 1 scientific paper (total in 1 paper)
Extreme light fields and their applications
Freestanding film structures for laser plasma experiments
E. B. Klyuenkov, A. Ya. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin
Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhnii Novgorod
The technique is developed for fabricating 5—500-nm-thick freestanding films of various materials and multilayer compositions. Apart from the traditional use in spectral filtration of soft X-ray and extreme ultraviolet radiation, the possibility of using the ultrathin films fabricated by this technique as targets in experiments on laser acceleration of ions is considered. A sample of the target in the form of a 5-nm-thick carbon film on a supporting net is fabricated.
freestanding multilayer structure, thin-film laser target, EUV filter.
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Quantum Electronics, 2013, 43:4, 388–391
07.85.Fv, 52.38.Ph, 78.67.-n, 81.07.-b
E. B. Klyuenkov, A. Ya. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, “Freestanding film structures for laser plasma experiments”, Kvantovaya Elektronika, 43:4 (2013), 388–391 [Quantum Electron., 43:4 (2013), 388–391]
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