Extreme light fields and their interaction with matter
Lasing efficiency of krypton ions in the (8–14)-nm band upon pulsed laser excitation
A. N. Nechai, S. A. Garakhin, A. Ya. Lopatin, V. N. Polkovnikov, D. G. Reunov, N. N. Salashchenko, M. N. Toropov, N. I. Chkhalo, N. N. Tsybin
Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhnii Novgorod
The emission spectra of krypton plasma in the range of 8–14 nm upon excitation of a pulsed gas jet by 1.06-μm Nd : YAG laser radiation with a pulse energy of 0.85 J, pulse duration of 5.2 ns, and repetition rate of 10 Hz are investigated. The krypton emission spectrum is a wide (8–14 nm) band, peaking at 10.3 nm, which is formed by a series of much narrower lines. The observed lines are identified, and the fraction of laser pulse energy converted into the (8–14)-nm emission band and emitted into half-space (2π sr) is determined. The maximum conversion efficiency is found to be 21%. The expected throughputs of lithographic systems with sources based on Sn, Xe, and Kr ions for different wavelengths, corresponding to the emission peaks of ions of these materials, are compared.
laser spark, krypton plasma, extreme UV radiation, pulsed gas target, conversion efficiency, lithography.
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Quantum Electronics, 2020, 50:4, 408–413
A. N. Nechai, S. A. Garakhin, A. Ya. Lopatin, V. N. Polkovnikov, D. G. Reunov, N. N. Salashchenko, M. N. Toropov, N. I. Chkhalo, N. N. Tsybin, “Lasing efficiency of krypton ions in the (8–14)-nm band upon pulsed laser excitation”, Kvantovaya Elektronika, 50:4 (2020), 408–413 [Quantum Electron., 50:4 (2020), 408–413]
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