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UFN, 2019, Volume 189, Number 3, Pages 323–334 (Mi ufn6375)  

This article is cited in 1 scientific paper (total in 1 paper)

CONFERENCES AND SYMPOSIA

Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection

D. B. Abramenkoab, P. S. Antsiferova, D. I. Astakhovac, A. Yu. Vinokhodovb, I. Yu. Vichevd, R. R. Gayazova, A. S. Grushind, L. A. Dorokhina, V. V. Ivanovab, D. A. Kimd, K. N. Koshelevab, P. V. Krainove, M. S. Krivokorytovabe, V. M. Krivtsunabe, B. V. Lakatoshe, A. A. Lashb, V. V. Medvedevace, A. N. Ryabtseva, Yu. V. Sidelnikova, E. P. Snegireva, A. D. Solomyannayad, M. V. Spiridonovfb, I. P. Tsygvintsevd, O. F. Yakushevg, A. A. Yakushkinb

a Institute of Spectroscopy, Russian Academy of Sciences, Troitsk, Moscow
b EUV Labs, Ltd., Troitsk, Moscow
c ISTEQ B.V.
d Keldysh Institute of Applied Mathematics, Russian Academy of Sciences, Moscow
e Moscow Institute of Physics and Technology (State University), Dolgoprudny, Moscow region
f Prokhorov General Physics Institute, Russian Academy of Sciences, Moscow
g Lebedev Physical Institute, Russian Academy of Sciences, Moscow

Abstract: We report on the development of plasma-based sources of extreme ultraviolet radiation for the next generation lithography and mask inspection and the development of equipment for spectral diagnostics of such sources.

Funding Agency Grant Number
Russian Science Foundation 14-11-00699
Russian Foundation for Basic Research 16-02-00753


DOI: https://doi.org/10.3367/UFNr.2018.06.038447

Full text: PDF file (1533 kB)
First page: PDF file
Full text: http://www.ufn.ru/ru/articles/2019/3/k/
References: PDF file   HTML file

English version:
Physics–Uspekhi, 2019, 62:3

Document Type: Article
PACS: 42.82.Cr, 52.25.Os, 52.59.-f, 52.70.-m, 52.77.-j
Received: August 28, 2018
Accepted: June 20, 2018

Citation: D. B. Abramenko, P. S. Antsiferov, D. I. Astakhov, A. Yu. Vinokhodov, I. Yu. Vichev, R. R. Gayazov, A. S. Grushin, L. A. Dorokhin, V. V. Ivanov, D. A. Kim, K. N. Koshelev, P. V. Krainov, M. S. Krivokorytov, V. M. Krivtsun, B. V. Lakatosh, A. A. Lash, V. V. Medvedev, A. N. Ryabtsev, Yu. V. Sidelnikov, E. P. Snegirev, A. D. Solomyannaya, M. V. Spiridonov, I. P. Tsygvintsev, O. F. Yakushev, A. A. Yakushkin, “Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection”, UFN, 189:3 (2019), 323–334

Citation in format AMSBIB
\Bibitem{AbrAntAst19}
\by D.~B.~Abramenko, P.~S.~Antsiferov, D.~I.~Astakhov, A.~Yu.~Vinokhodov, I.~Yu.~Vichev, R.~R.~Gayazov, A.~S.~Grushin, L.~A.~Dorokhin, V.~V.~Ivanov, D.~A.~Kim, K.~N.~Koshelev, P.~V.~Krainov, M.~S.~Krivokorytov, V.~M.~Krivtsun, B.~V.~Lakatosh, A.~A.~Lash, V.~V.~Medvedev, A.~N.~Ryabtsev, Yu.~V.~Sidelnikov, E.~P.~Snegirev, A.~D.~Solomyannaya, M.~V.~Spiridonov, I.~P.~Tsygvintsev, O.~F.~Yakushev, A.~A.~Yakushkin
\paper Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection
\jour UFN
\yr 2019
\vol 189
\issue 3
\pages 323--334
\mathnet{http://mi.mathnet.ru/ufn6375}
\crossref{https://doi.org/10.3367/UFNr.2018.06.038447}
\elib{http://elibrary.ru/item.asp?id=37038658}


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    1. Grigoryev S.Yu., Lakatosh B.V., Krivokorytov M.S., Zhakhovsky V.V., Dyachkov S.A., Ilnitsky D.K., Migdal K.P., Inogamov N.A., Vinokhodov A.Yu., Kompanets V.O., Sidelnikov Yu.V., Krivtsun V.M., Koshelev K.N., Medvedev V.V., “Expansion and Fragmentation of a Liquid-Metal Droplet By a Short Laser Pulse”, Phys. Rev. Appl., 10:6 (2018), 064009  crossref  isi
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