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Num. Meth. Prog., 2012, Volume 13, Issue 4, Pages 491–496 (Mi vmp55)  

Вычислительные методы и приложения

High performance modeling of modern deposition processes for optical coating nanotechnology

A. V. Tikhonravov, I. V. Kochikov, T. V. Amochkina, F. V. Grigor'ev, O. A. Kondakova, V. B. Sulimov

M.V. Lomonosov Moscow State University, Research Computing Center

Abstract: Applicability of the method of molecular dynamics (MD) to the simulation of modern processes of deposition of optical coatings is studied. The choice of physical and technological aspects of deposition processes is explained and the most meaningful parameters of computer simulation are estimated. The first results of MD simulation of silica dioxide film growth are discussed. These results demonstrate good perspectives of high performance modeling of deposition processes.

Keywords: high performance modeling; molecular dynamics; thin films; deposition processes.

Full text: PDF file (611 kB)
UDC: 519.688
Received: 02.10.2012

Citation: A. V. Tikhonravov, I. V. Kochikov, T. V. Amochkina, F. V. Grigor'ev, O. A. Kondakova, V. B. Sulimov, “High performance modeling of modern deposition processes for optical coating nanotechnology”, Num. Meth. Prog., 13:4 (2012), 491–496

Citation in format AMSBIB
\Bibitem{TikKocAmo12}
\by A.~V.~Tikhonravov, I.~V.~Kochikov, T.~V.~Amochkina, F. V. Grigor'ev, O. A. Kondakova, V.~B.~Sulimov
\paper High performance modeling of modern deposition processes for optical coating nanotechnology
\jour Num. Meth. Prog.
\yr 2012
\vol 13
\issue 4
\pages 491--496
\mathnet{http://mi.mathnet.ru/vmp55}


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  • Numerical methods and programming
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