Doklady Akademii Nauk SSSR
RUS  ENG    JOURNALS   PEOPLE   ORGANISATIONS   CONFERENCES   SEMINARS   VIDEO LIBRARY   PACKAGE AMSBIB  
General information
Latest issue
Archive

Search papers
Search references

RSS
Latest issue
Current issues
Archive issues
What is RSS


Dokl. Akad. Nauk:
Year:
Volume:
Issue:
Page:
Find




Personal entry:
Login:
Password:
Save password
Enter
Forgotten password?
Register

Doklady Akademii Nauk SSSR, 1970, Volume 192, Number 3, Pages 559–561 (Mi dan35434)  
CRYSTALLOGRAPHY

Crystallization of amorphous silicon dioxide films during ion bombardment and subsequent annealing

P. V. Pavlov, È. V. Shitova, E. I. Zorin

Scientific-Research Physicotechnical Institute at the Gor'kii State University
Full-text PDF (379 kB)
Presented: N. V. Belov
Received: 20.10.1969
Document Type: Article
UDC: 539.235
Language: Russian
Citation: P. V. Pavlov, È. V. Shitova, E. I. Zorin, “Crystallization of amorphous silicon dioxide films during ion bombardment and subsequent annealing”, Dokl. Akad. Nauk SSSR, 192:3 (1970), 559–561
Citation in format AMSBIB
\Bibitem{PavShiZor70}
\by P.~V.~Pavlov, \`E.~V.~Shitova, E.~I.~Zorin
\paper Crystallization of amorphous silicon dioxide films during ion bombardment and subsequent annealing
\jour Dokl. Akad. Nauk SSSR
\yr 1970
\vol 192
\issue 3
\pages 559--561
\mathnet{http://mi.mathnet.ru/dan35434}
Linking options:
  • https://www.mathnet.ru/eng/dan35434
  • https://www.mathnet.ru/eng/dan/v192/i3/p559
    • Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    Statistics & downloads:
    Abstract page:161
    Full-text PDF :72
    References:5
     
      Contact us:
    		  Terms of Use  Registration to the website  Logotypes © Steklov Mathematical Institute RAS, 2026