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This article is cited in 4 scientific papers (total in 4 papers)
Semiconductors
Getter formation in silicon by implantation of antimony ions
P. K. Sadovskiia, A. R. Chelyadinskiia, V. B. Odzaeva, M. I. Tarasika, A. S. Turtsevichb, Yu. B. Vasil'evb a Belarusian State University, Minsk
b JSC “INTEGRAL”
Abstract:
A porous silicon layer as a getter of uncontrolled impurities has been prepared by implantation of Sb$^+$ into silicon and subsequent thermal treatments. The lifetime of nonequilibrium charge carriers in $n$- and $p$-type silicon wafers with a getter layer is 3–4 times longer than that without a getter.
Received: 06.12.2012
Citation:
P. K. Sadovskii, A. R. Chelyadinskii, V. B. Odzaev, M. I. Tarasik, A. S. Turtsevich, Yu. B. Vasil'ev, “Getter formation in silicon by implantation of antimony ions”, Fizika Tverdogo Tela, 55:6 (2013), 1071–1073; Phys. Solid State, 55:6 (2013), 1156–1158
Linking options:
https://www.mathnet.ru/eng/ftt12444 https://www.mathnet.ru/eng/ftt/v55/i6/p1071
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