A. A. Bykov, E. G. Mozulev, A. K. Kalagin, “Resonance microwave photoresistance of a two-subband electron system at large filling factors”, Pis'ma v Zh. Èksper. Teoret. Fiz., 92:6 (2010), 420–423; JETP Letters, 92:6 (2010), 379

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Pis'ma v Zhurnal Èksperimental'noi i Teoreticheskoi Fiziki, 2010, Volume 92, Issue 6, Pages 420–423 (Mi jetpl1418)

This article is cited in 4 scientific papers (total in 4 papers)

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Resonance microwave photoresistance of a two-subband electron system at large filling factors

A. A. Bykov^a, E. G. Mozulev^b, A. K. Kalagin^a

^a Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia
^b Novosibirsk State University, Novosibirsk, Russia

Full-text PDF (199 kB) Citations (4)

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Received: 04.08.2010

English version:
Journal of Experimental and Theoretical Physics Letters, 2010, Volume 92, Issue 6, Pages 379–382
DOI: https://doi.org/10.1134/S0021364010180049

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Document Type: Article

Language: Russian

Citation: A. A. Bykov, E. G. Mozulev, A. K. Kalagin, “Resonance microwave photoresistance of a two-subband electron system at large filling factors”, Pis'ma v Zh. Èksper. Teoret. Fiz., 92:6 (2010), 420–423; JETP Letters, 92:6 (2010), 379–382

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This publication is cited in the following 4 articles:

Citing articles in Google Scholar: Russian citations, English citations
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