Extreme-ultraviolet source based on the electron-cyclotron-resonance discharge

An extreme-ultraviolet (EUV) source based on a low-pressure discharge sustained in a magnetic trap by the high-power millimeter-wave radiation under electron-cyclotron-resonance (ECR) conditions is discussed. Multiply charged ions are efficiently generated and excited in such a discharge (tin ions injected into the trap from a vacuum-arc discharge were used) and emit line radiation in the desired wavelength range. A radiation power of 50 W in a wavelength range of 13.5 nm ± 1% and an efficiency of about 1% for the conversion of the micro-wave radiation absorbed in the plasma to the extreme ultraviolet radiation were achieved in the preliminary experiments.