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Zhurnal Tekhnicheskoi Fiziki, 2023, Volume 93, Issue 1, Pages 89–94
DOI: https://doi.org/10.21883/JTF.2023.01.54067.219-22 (Mi jtf6919) 		 
Plasma

In situ probe measurements of plasma parameters during the deposition of boron coatings by the magnetron method

V. I. Gushenetsa, A. S. Bugaeva, A. V. Vizir'a, E. M. Oksab, A. G. Nikolaeva, G. Yu. Yushkova

a Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, Tomsk, Russia
b Tomsk Institute of Control Systems and Radioelectronics, Tomsk, Russia
Full-text PDF (362 kB)
DOI: https://doi.org/10.21883/JTF.2023.01.54067.219-22
Abstract: The features of the probe technique are described and the results of measuring the parameters of plasma generated by a planar magnetron sputtering system with a pure boron target during coating deposition are presented. A feature of probe measurements was the use of heating the collecting surface of a single Langmuir probe. Heating led to a decrease in the electrical resistance of the boron film on the surface, which made it possible to carry out in situ probe measurements of the magnetron discharge plasma parameters during the entire process of boron coating.
Keywords: plasma parameters, probe method, planar magnetron, boron films.
Funding agency Grant number
Ministry of Science and Higher Education of the Russian Federation 075-15-2021-1348
This study was supported by the Ministry of Science and Higher Education of the Russian Federation (project № 075-15-2021-1348) within the activity № 2.1.6.
Received: 07.09.2022
Revised: 12.10.2022
Accepted: 14.10.2022
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: V. I. Gushenets, A. S. Bugaev, A. V. Vizir', E. M. Oks, A. G. Nikolaev, G. Yu. Yushkov, “In situ probe measurements of plasma parameters during the deposition of boron coatings by the magnetron method”, Zhurnal Tekhnicheskoi Fiziki, 93:1 (2023), 89–94
Citation in format AMSBIB
\Bibitem{GusBugViz23}
\by V.~I.~Gushenets, A.~S.~Bugaev, A.~V.~Vizir', E.~M.~Oks, A.~G.~Nikolaev, G.~Yu.~Yushkov
\paper In situ probe measurements of plasma parameters during the deposition of boron coatings by the magnetron method
\jour Zhurnal Tekhnicheskoi Fiziki
\yr 2023
\vol 93
\issue 1
\pages 89--94
\mathnet{http://mi.mathnet.ru/jtf6919}
\crossref{https://doi.org/10.21883/JTF.2023.01.54067.219-22}
\elib{https://elibrary.ru/item.asp?id=50177073}
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