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XXVII International Symposium "Nanophysics and Nanoelectronics" N. Novgorod, March 13-16, 2023
Plasma
Emission characteristics of a laser-plasma source of extreme ultraviolet radiation with thin-film targets
A. Ya. Lopatina, V. I. Luchina, A. N. Nechaia, A. A. Perekalova, A. E. Pestova, N. N. Salashchenkoa, A. A. Solov'evb, N. N. Tsybina, N. I. Chkhaloa a Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhny Novgorod, Russia
b Institute of Applied Physics, Russian Academy of Sciences,
603950 Nizhny Novgorod, Russia
Abstract:
The radiation spectra in the soft X-ray and extreme ultraviolet wavelength ranges of thin-film (0.15 $\mu$m) targets made of light materials (Si, C, Be) were studied when excited by a Nd:YAG laser pulse with a duration of 5.2 ns focused to an intensity of $\sim$10$^{12}$ W/cm$^2$. Line spectra of BeIII, BeIV, CV, and SiV ions were recorded using a spectrometer based on a multilayer X-ray mirror. A comparison with the spectra of bulk solid-state targets of the same materials is carried out. In all cases, there was a decrease in the intensity of the lines of the soft X-ray spectrum of film targets compared to monolithic ones; the decrease was, depending on the material, from several tens of percent to several times, with more than an order of magnitude less mass of the vaporized substance. Keywords:
Keywords:
SXR and EUV radiation, thin films, laser plasma.
Received: 19.04.2023 Revised: 19.04.2023 Accepted: 19.04.2023
Citation:
A. Ya. Lopatin, V. I. Luchin, A. N. Nechai, A. A. Perekalov, A. E. Pestov, N. N. Salashchenko, A. A. Solov'ev, N. N. Tsybin, N. I. Chkhalo, “Emission characteristics of a laser-plasma source of extreme ultraviolet radiation with thin-film targets”, Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023), 892–896
Linking options:
https://www.mathnet.ru/eng/jtf7023 https://www.mathnet.ru/eng/jtf/v93/i7/p892
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