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Zhurnal Tekhnicheskoi Fiziki, 2023, Volume 93, Issue 10, Pages 1401–1402
DOI: https://doi.org/10.61011/JTF.2023.10.56276.147-23 (Mi jtf7103) 		 
Atomic and molecular physics

Comment to the paper by A.I. Tolmachev and L. Forlano “Depemdence of the sputtering yield on the angle of ion incidence on the target surface” (2022, V. 92. Issue 5. P. 660–664)

V. I. Shulga

Lomonosov Moscow State University, Skobeltsyn Institute of Nuclear Physics, Moscow, Russia
Full-text PDF (158 kB)
DOI: https://doi.org/10.61011/JTF.2023.10.56276.147-23
Abstract: A criitical analysis of the approach applied by A.I. Tolmachev and L. Forlano (ZhTF, 92 (5), 660 (2022)) to solving the problem of ion sputtering of solids is presented.
Keywords: sputtering, angular dependence of the sputtering yield, computer simulation, program PAOLA, program SRIM, transport equation, binary collisions.
Received: 10.06.2023
Revised: 10.06.2023
Accepted: 14.08.2023
Bibliographic databases:
Document Type: Letter, errata
Language: Russian
Citation: V. I. Shulga, “Comment to the paper by A.I. Tolmachev and L. Forlano “Depemdence of the sputtering yield on the angle of ion incidence on the target surface” (2022, V. 92. Issue 5. P. 660–664)”, Zhurnal Tekhnicheskoi Fiziki, 93:10 (2023), 1401–1402
Citation in format AMSBIB
\Bibitem{Shu23}
\by V.~I.~Shulga
\paper Comment to the paper by A.I. Tolmachev and L. Forlano ``Depemdence of the sputtering yield on the angle of ion incidence on the target surface'' (2022, V. 92. Issue 5. P. 660--664)
\jour Zhurnal Tekhnicheskoi Fiziki
\yr 2023
\vol 93
\issue 10
\pages 1401--1402
\mathnet{http://mi.mathnet.ru/jtf7103}
\crossref{https://doi.org/10.61011/JTF.2023.10.56276.147-23}
\elib{https://elibrary.ru/item.asp?id=55171644}
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