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Solid-State Electronics
Gradient layers in a four-component Al–Ga–As–Sn system growth by liquid-phase epitaxy
N. S. Potapovich, V. P. Khvostikov, O. A. Khvostikova, A. S. Vlasov Ioffe Institute, St. Petersburg, Russia
Abstract:
The growth of thick (more than 50 $\mu$m) Al$_x$Ga$_{1-x}$As gradient layers in the Al–Ga–As–Sn system has been modeled. Sn-doped Al$_x$Ga$_{1-x}$As layers up to 85 $\mu$m thick were obtained by liquid-phase epitaxy. The obtained experimental profiles of the Al$_x$Ga$_{1-x}$As composition gradient satisfy the used theoretical model for the cases of growth from a limited volume of a solution-melt.
Keywords:
liquid phase epitaxy, AlGaAs, phase equilibrium, photovoltaic cell, gradient layers.
Received: 05.07.2023 Revised: 23.08.2023 Accepted: 25.08.2023
Citation:
N. S. Potapovich, V. P. Khvostikov, O. A. Khvostikova, A. S. Vlasov, “Gradient layers in a four-component Al–Ga–As–Sn system growth by liquid-phase epitaxy”, Zhurnal Tekhnicheskoi Fiziki, 93:10 (2023), 1476–1480
Linking options:
https://www.mathnet.ru/eng/jtf7113 https://www.mathnet.ru/eng/jtf/v93/i10/p1476
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