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Zhurnal Tekhnicheskoi Fiziki, 2023, Volume 93, Issue 10, Pages 1476–1480
DOI: https://doi.org/10.61011/JTF.2023.10.56286.168-23
(Mi jtf7113)
 

Solid-State Electronics

Gradient layers in a four-component Al–Ga–As–Sn system growth by liquid-phase epitaxy

N. S. Potapovich, V. P. Khvostikov, O. A. Khvostikova, A. S. Vlasov

Ioffe Institute, St. Petersburg, Russia
Abstract: The growth of thick (more than 50 $\mu$m) Al$_x$Ga$_{1-x}$As gradient layers in the Al–Ga–As–Sn system has been modeled. Sn-doped Al$_x$Ga$_{1-x}$As layers up to 85 $\mu$m thick were obtained by liquid-phase epitaxy. The obtained experimental profiles of the Al$_x$Ga$_{1-x}$As composition gradient satisfy the used theoretical model for the cases of growth from a limited volume of a solution-melt.
Keywords: liquid phase epitaxy, AlGaAs, phase equilibrium, photovoltaic cell, gradient layers.
Funding agency Grant number
Russian Science Foundation 22-19-00057
This study was supported by a grant from the Russian Science Foundation, project № 22-19-00057, https://rscf.ru/en/project/22-19-00057/.
Received: 05.07.2023
Revised: 23.08.2023
Accepted: 25.08.2023
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: N. S. Potapovich, V. P. Khvostikov, O. A. Khvostikova, A. S. Vlasov, “Gradient layers in a four-component Al–Ga–As–Sn system growth by liquid-phase epitaxy”, Zhurnal Tekhnicheskoi Fiziki, 93:10 (2023), 1476–1480
Citation in format AMSBIB
\Bibitem{PotKhvKhv23}
\by N.~S.~Potapovich, V.~P.~Khvostikov, O.~A.~Khvostikova, A.~S.~Vlasov
\paper Gradient layers in a four-component Al--Ga--As--Sn system growth by liquid-phase epitaxy
\jour Zhurnal Tekhnicheskoi Fiziki
\yr 2023
\vol 93
\issue 10
\pages 1476--1480
\mathnet{http://mi.mathnet.ru/jtf7113}
\crossref{https://doi.org/10.61011/JTF.2023.10.56286.168-23}
\elib{https://elibrary.ru/item.asp?id=55171680}
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