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This article is cited in 1 scientific paper (total in 1 paper)
XXVI International Symposium "Nanophysics and nanoelectronics", N.Novgorod, 14 - 17 March 2022
Physics of Nanostructures
Formation of inhomogeneous oxide and suboxide layers on an ultra-thin metal film by multiple oxidation and ion sputtering
A. V. Lubenchenkoa, D. A. Ivanova, O. I. Lubenchenkoa, A. B. Pavolotskyb, D. S. Lukyantseva, V. A. Iachuka, O. N. Pavlova a National Research University "Moscow Power Engineering Institute", 111250 Moscow, Russia
b Chalmers University of Technology, 41296 Göteborg, Sweden
Abstract:
A technique of controlled formation of multilayer oxide and suboxide layers on a thin metal film. An opportunity of controlled generation of films containing an ultra-thin suboxide layer inside a higher oxide layer and films being a periodic layered structure with alternating oxide layers of various oxidation levels. A structure containing alternating ultra-thin layers of higher oxide and suboxide layers on a niobium film.
Keywords:
metal-oxide films, controlled film formation, layer chemical and phase profiling, X-ray photoelectron spectroscopy.
Received: 30.03.2022 Revised: 30.03.2022 Accepted: 30.03.2022
Citation:
A. V. Lubenchenko, D. A. Ivanov, O. I. Lubenchenko, A. B. Pavolotsky, D. S. Lukyantsev, V. A. Iachuk, O. N. Pavlov, “Formation of inhomogeneous oxide and suboxide layers on an ultra-thin metal film by multiple oxidation and ion sputtering”, Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1172–1178
Linking options:
https://www.mathnet.ru/eng/jtf7412 https://www.mathnet.ru/eng/jtf/v92/i8/p1172
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