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This article is cited in 1 scientific paper (total in 1 paper)
XXVI International Symposium "Nanophysics and nanoelectronics", N.Novgorod, 14 - 17 March 2022
Photonics
Prospective wavelengths for projection lithography uing synchrotron radiation
N. I. Chkhalo, V. N. Polkovnikov, N. N. Salashchenko, R. A. Shaposhnikov Institute for Physics of Microstructures, Russian Academy of Sciences, 607680 Nizhny Novgorod, Russia
Abstract:
Promising wavelengths for next-generation lithography with a wavelength shorter than 13.5 nm based on a synchrotron X-ray source are discussed. Theoretical and experimental values of the reflection coefficients of multilayer X-ray mirrors providing the maximum reflectivity in the range of 11.4–3.1 nm are presented. The theoretical efficiency of multilayer optics is compared for different wavelengths.
Keywords:
X-ray lithography, multilayer X-ray optics, multilayer X-ray mirrors.
Received: 26.04.2022 Revised: 26.04.2022 Accepted: 26.04.2022
Citation:
N. I. Chkhalo, V. N. Polkovnikov, N. N. Salashchenko, R. A. Shaposhnikov, “Prospective wavelengths for projection lithography uing synchrotron radiation”, Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1207–1212
Linking options:
https://www.mathnet.ru/eng/jtf7418 https://www.mathnet.ru/eng/jtf/v92/i8/p1207
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