Formation of (Co$_{40}$Fe$_{40}$B$_{20}$)$_x$(LiNbO$_3$)$_{100-x}$ composite film on a metallic substrate

The topological features of the formation of (Co$_{40}$Fe$_{40}$B$_{20}$)$_{15}$(LiNbO$_3$)$_{85}$ composite films deposited by ion-beam method on a metal electrode Cr/Cu/Cr has been investigated. The presence of a dielectric layer between the upper Cr layer and the CoFe–LiNbO$_3$ film with a thickness of $d_{ox}\approx$ 15 nm has been established. The difference in the size of granules near the amorphous layer and in the volume of the film has been shown. A model of the formation of (Co$_{40}$Fe$_{40}$B$_{20}$)$_x$(LiNbO$_3$)$_{100-x}$ nanocomposite film at the initial stage of growth has been proposed. It has been shown that the formation of $\alpha$-LiNbO$_3$ layer on the chrome metal film surface is possible with the realization of island and layer-by-layer growth mechanisms for various phases of the composite.