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This article is cited in 13 scientific papers (total in 13 papers)
Brief Communications
Electronic structure of Ga$_{1-x}$Al$_x$As nanostructures grown on the GaAs surface by ion implantation
S. B. Donaev, B. E. Umirzakov, D. A. Tashmukhamedova Tashkent State Technical University named after Islam Karimov
Abstract:
The surface morphology and electronic properties of nanocrystalline phases and 2–7-nm-thick Ga$_{1-x}$Al$_x$As films grown on the GaAs(111) surface by Al$^+$ ion implantation with subsequent (laser + thermal) annealing are studied. It is found that bandgap $E_g$ of the Ga$_{0.5}$Al$_{0.5}$As nanocrystalline surface phase 25–30 nm in size equals 2.8–2.9 eV.
Received: 13.01.2015
Citation:
S. B. Donaev, B. E. Umirzakov, D. A. Tashmukhamedova, “Electronic structure of Ga$_{1-x}$Al$_x$As nanostructures grown on the GaAs surface by ion implantation”, Zhurnal Tekhnicheskoi Fiziki, 85:10 (2015), 148–151; Tech. Phys., 60:10 (2015), 1563–1566
Linking options:
https://www.mathnet.ru/eng/jtf7922 https://www.mathnet.ru/eng/jtf/v85/i10/p148
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