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This article is cited in 5 scientific papers (total in 5 papers)
Brief Communications
Effect of implantation of active metal ions on the elemental and chemical compositions of the CdTe surface
Z. È. Ìuhtarova, Z. A. Isakhanova, B. E. Umirzakova, T. Kodirova, E. S. Ergashevb a Institute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences, Tashkent
b Tashkent State Technical University named after Islam Karimov
Abstract:
We study the effect of bombardment with Ar$^+$ and Ba$^+$ ions on the composition and electron structure of the CdTe film surface. The optimal ion implantation and annealing regimes for obtaining a nanofilm of the Cd$_{0.5}$Âà$_{0.5}$Te type are determined. It is found that the value of $E_g$ of the three-component film decreases from 1.9 to 1.7 eV upon an increase in its thickness from 20 to 40 nm.
Received: 20.03.2015
Citation:
Z. È. Ìuhtarov, Z. A. Isakhanov, B. E. Umirzakov, T. Kodirov, E. S. Ergashev, “Effect of implantation of active metal ions on the elemental and chemical compositions of the CdTe surface”, Zhurnal Tekhnicheskoi Fiziki, 85:12 (2015), 146–149; Tech. Phys., 60:12 (2015), 1880–1883
Linking options:
https://www.mathnet.ru/eng/jtf7972 https://www.mathnet.ru/eng/jtf/v85/i12/p146
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