Electron mirror as a corrector of electron microscope objective aberrations

We describe a new optoelectronic system for correcting aberrations of the objective lens with the help of an electron mirror. The system is based on the implementation of a special focusing regime (so-called regime of superimposed images) in which two images of the object are formed in the plane passing through the center of the curvature of the mirror. One of these images is formed by the beams (with aberrations) emerging from the objective lens, and the other is formed by the beams (with cancelled aberrations) reflected from the mirror. The separation of the two superimposed images and visualization of the image with cancelled aberrations are performed by deflection of the electron beam in the axisymmetric magnetic field whose symmetry axis passes through the center of curvature of the electron mirror. The magnetic field distribution ensuring aberration-free deflection of the electron beam is calculated.