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Zhurnal Tekhnicheskoi Fiziki, 2013, Volume 83, Issue 9, Pages 146–149
(Mi jtf8548)
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This article is cited in 15 scientific papers (total in 15 papers)
Brief Communications
Analysis of the structure and properties of heterostructured nanofilms prepared by epitaxy and ion implantation methods
B. E. Umirzakov, D. A. Tashmukhamedova, M. K. Ruzibaeva, A. K. Tashatov, S. B. Donaev, B. B. Mavlyanov Institute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences, Tashkent
Abstract:
The energy band diagram of multilayer nanofilm systems formed on the basis of Si, GaAs, and CaF$_2$ is constructed. The optimal regimes of obtaining homogeneous films of a complex composition are determined
Received: 23.05.2012 Accepted: 29.01.2013
Citation:
B. E. Umirzakov, D. A. Tashmukhamedova, M. K. Ruzibaeva, A. K. Tashatov, S. B. Donaev, B. B. Mavlyanov, “Analysis of the structure and properties of heterostructured nanofilms prepared by epitaxy and ion implantation methods”, Zhurnal Tekhnicheskoi Fiziki, 83:9 (2013), 146–149; Tech. Phys., 58:9 (2013), 1383–1386
Linking options:
https://www.mathnet.ru/eng/jtf8548 https://www.mathnet.ru/eng/jtf/v83/i9/p146
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