|
This article is cited in 1 scientific paper (total in 1 paper)
Brief Communications
Effect of the deposition parameters on the structure and physicochemical properties of protective Al$_2$O$_3$ coatings
A. D. Pogrebnyaka, F. F. Komarovb, A. Sh. Kaverinaa, O. V. Sobol'c, Yu. N. Tyurind, A. I. Kupchishine, M. K. Kylyshkanovf a Sumy State University
b Belarusian State University, Minsk
c Khar'kov Polytechnical University
d E. O. Paton Electric Welding Institute, National Academy of Sciences of Ukraine
e Kazakh National Pedagogical University
f East Kazakhstan State Technical University named after D. Serikbayev, Ust-Kamenogorsk
Abstract:
Three series of Al$_2$O$_3$ coating samples are fabricated by microarc oxidation under various deposition conditions and are studied by scanning electron microscopy (SEM) in combination with energy-dispersive x-ray spectroscopy (EDXS), Rutherford backscattering, and X-ray diffraction. Defects and pores in the coatings are analyzed by positron annihilation spectroscopy at room temperature without vacuum. No nanometer pores are detected in the coatings. When changing the electrolyte-plasma oxidation conditions, one can change the concentration and the ratio of the types of vacancy defects in these Al$_2$O$_3$ coatings.
Received: 10.10.2012 Accepted: 29.01.2013
Citation:
A. D. Pogrebnyak, F. F. Komarov, A. Sh. Kaverina, O. V. Sobol', Yu. N. Tyurin, A. I. Kupchishin, M. K. Kylyshkanov, “Effect of the deposition parameters on the structure and physicochemical properties of protective Al$_2$O$_3$ coatings”, Zhurnal Tekhnicheskoi Fiziki, 83:11 (2013), 142–145; Tech. Phys., 58:11 (2013), 1688–1691
Linking options:
https://www.mathnet.ru/eng/jtf8627 https://www.mathnet.ru/eng/jtf/v83/i11/p142
|
|