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Zhurnal Tekhnicheskoi Fiziki, 2012, Volume 82, Issue 7, Pages 134–136
(Mi jtf8885)
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This article is cited in 13 scientific papers (total in 13 papers)
Brief Communications
Magnetron discharge in an argon-oxygen mixture for deposition of a titanium oxide film
A. E. Komlev, V. I. Shapovalov, N. S. Shutova Saint Petersburg Electrotechnical University "LETI"
Abstract:
A discharge in a planar magnetron with a titanium target is studied. It is found that a pressure rise from 2 to 6 mTorr in argon at a constant current increases the intensity of excited argon ion lines by almost 20%. The excitation of neutral titanium atoms is independent of the argon pressure: it depends on only the discharge current. The current-voltage characteristic of the magnetron in an argon-oxygen mixture completely reflects processes proceeding on the target of the magnetron.
Received: 17.08.2011
Citation:
A. E. Komlev, V. I. Shapovalov, N. S. Shutova, “Magnetron discharge in an argon-oxygen mixture for deposition of a titanium oxide film”, Zhurnal Tekhnicheskoi Fiziki, 82:7 (2012), 134–136; Tech. Phys., 57:7 (2012), 1030–1033
Linking options:
https://www.mathnet.ru/eng/jtf8885 https://www.mathnet.ru/eng/jtf/v82/i7/p134
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