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Zhurnal Tekhnicheskoi Fiziki, 2011, Volume 81, Issue 2, Pages 75–81
(Mi jtf9049)
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This article is cited in 4 scientific papers (total in 4 papers)
Solids
Tensoresistive effect in thin metal films in the range of elastic and plastic strain
I. P. Buryk, D. V. Velykodnyi, L. V. Odnodvorets, I. E. Protsenko, E. P. Tkach Sumy State University
Abstract:
The tensoresistive effect in single-layer Cr, Fe, Mo, Ni, and Pd films and double-layer Fe/Cr, Cu/Cr, Ni/Cr, and Pd/Fe films is studied in the range of elastic and plastic strain. The influence of the surface and grain-boundary scatterings of electrons on strain sensitivity $S^{\rho}$ of the single-layer films is analyzed. Sensitivities $S^{\rho}$ of the single- and double-layer films to elastic and plastic strains are compared. It is found that the volume and grain-boundary scatterings of electrons are main contributors to $S^{\rho}$ in the Fe/Cr film system. Grain-boundary scattering is equally effective under elastic and plastic strain, as judged by a high coefficient of electron grain-boundary scattering ($R\cong$ 0.36–0.41).
Received: 22.04.2010
Citation:
I. P. Buryk, D. V. Velykodnyi, L. V. Odnodvorets, I. E. Protsenko, E. P. Tkach, “Tensoresistive effect in thin metal films in the range of elastic and plastic strain”, Zhurnal Tekhnicheskoi Fiziki, 81:2 (2011), 75–81; Tech. Phys., 56:2 (2011), 232–237
Linking options:
https://www.mathnet.ru/eng/jtf9049 https://www.mathnet.ru/eng/jtf/v81/i2/p75
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