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Zhurnal Tekhnicheskoi Fiziki, 2011, Volume 81, Issue 10, Pages 122–128 (Mi jtf9266)  

This article is cited in 10 scientific papers (total in 10 papers)

Surfaces, Electron and Ion Emission

Growth of Fe$_3$O$_4$ films on the Si(111) surface covered by a thin SiO$_2$ layer

V. V. Balashevab, V. V. Korobtsovab, T. A. Pisarenkoab, L. A. Chebotkevichb

a Institute for Automation and Control Processes, Far Eastern Branch of the Russian Academy of Sciences, Vladivostok
b Institute of Physics and Information Technologies, Far Eastern Federal University, Vladivostok
Abstract: Magnetite polycrystalline films are grown by variously oxidizing a Fe film on the Si(111) surface covered by a thin (1.5 nm) SiO$_2$ layer. It is found that defects in the SiO$_2$ layer influence silicidation under heating of the Fe film. The high-temperature oxidation of the Fe film results in the formation of both Fe$_3$O$_4$ and iron monosilicide. However, the high-temperature deposition of Fe in an oxygen atmosphere leads to the growth of a compositionally uniform Fe$_3$O$_4$ film on the SiO$_2$ surface. It is found that such a synthesis method causes [311] texture to arise in the magnetite film, with the texture axis normal to the surface. The influence of the synthesis method on the magnetic properties of grown Fe$_3$O$_4$ films is studied. A high coercive force of Fe$_3$O$_4$ films grown by Fe film oxidation is related to their specific morphology and compositional nonuniformity.
Received: 11.01.2011
English version:
Technical Physics, 2011, Volume 56, Issue 10, Pages 1501–1507
DOI: https://doi.org/10.1134/S1063784211100033
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: V. V. Balashev, V. V. Korobtsov, T. A. Pisarenko, L. A. Chebotkevich, “Growth of Fe$_3$O$_4$ films on the Si(111) surface covered by a thin SiO$_2$ layer”, Zhurnal Tekhnicheskoi Fiziki, 81:10 (2011), 122–128; Tech. Phys., 56:10 (2011), 1501–1507
Citation in format AMSBIB
\Bibitem{BalKorPis11}
\by V.~V.~Balashev, V.~V.~Korobtsov, T.~A.~Pisarenko, L.~A.~Chebotkevich
\paper Growth of Fe$_3$O$_4$ films on the Si(111) surface covered by a thin SiO$_2$ layer
\jour Zhurnal Tekhnicheskoi Fiziki
\yr 2011
\vol 81
\issue 10
\pages 122--128
\mathnet{http://mi.mathnet.ru/jtf9266}
\elib{https://elibrary.ru/item.asp?id=20325295}
\transl
\jour Tech. Phys.
\yr 2011
\vol 56
\issue 10
\pages 1501--1507
\crossref{https://doi.org/10.1134/S1063784211100033}
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  • https://www.mathnet.ru/eng/jtf/v81/i10/p122
  • This publication is cited in the following 10 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
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