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Mendeleev Communications, 1992, Volume 2, Issue 2, Pages 62–64
DOI: https://doi.org/10.1070/MC1992v002n02ABEH000135
(Mi mendc5406)
 

This article is cited in 5 scientific papers (total in 5 papers)

Dry Photochemical Etching of Metallic Films

A. V. Vannikov, A. D. Grishina, M. G. Tedoradze

A.N. Frumkin Institute of Electrochemistry, Russian Academy of Sciences, Moscow, Russian Federation
Full-text PDF (734 kB) Citations (5)
Abstract: The illumination of a light sensitive polymer layer cast on top of a metallic film (Al or Bi) leads to etching of the metallic film; the light-sensitive layer consists of a polymer binder, including aromatic amines and hexabromodimethylsulfone; the additional use of an optical amplification process results in a new, dry, highly sensitive method of metallic film etching.
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Document Type: Article
Language: English


Citation: A. V. Vannikov, A. D. Grishina, M. G. Tedoradze, “Dry Photochemical Etching of Metallic Films”, Mendeleev Commun., 2:2 (1992), 62–64
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  • This publication is cited in the following 5 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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