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Mendeleev Communications, 1991, Volume 1, Issue 1, Pages 34–36
DOI: https://doi.org/10.1070/MC1991v001n01ABEH000020 (Mi mendc5481) 		 
This article is cited in 4 scientific papers (total in 4 papers)

Novel Photochemical Crosslinking Polymer Systems with High Sensitivity for Negative Resist Applications

A. V. Vannikov, A. D. Grishina, M. G. Tedoradze

A.N. Frumkin Institute of Electrochemistry, Russian Academy of Sciences, Moscow, Russian Federation
Full-text PDF (310 kB) Citations (4)
DOI: https://doi.org/10.1070/MC1991v001n01ABEH000020
Abstract: A process of both photochemical and thermally induced chemical amplification of the effect of primary light irradiation has been realized in the photochemical crosslinking of polyvinylethylal layers containing diphenylbenzylamine and hexabromodimethylsulphone, allowing us to obtain new highly sensitive photoresists.
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Document Type: Article
Language: English


Citation: A. V. Vannikov, A. D. Grishina, M. G. Tedoradze, “Novel Photochemical Crosslinking Polymer Systems with High Sensitivity for Negative Resist Applications”, Mendeleev Commun., 1:1 (1991), 34–36
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  • https://www.mathnet.ru/eng/mendc/v1/i1/p34
    • This publication is cited in the following 4 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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