Photosensitive thiol–ene composition for DLP 3D printing of thermally stable polymer materials

N-allylated derivatives with a modification degree of 80% were obtained by reacting poly[N,N′-(1,3-phenylene)isophthalamide] with allyl bromide in the presence of a strong base. Using the obtained functionalized polyamide and pentaerythritol tetrakis(3-mercaptopropionate), we formulated new photo- sensitive compositions capable of forming crosslinked structures due to UV-initiated thiol–ene polymerization. High-resolution 3D objects that are heat resistant up to 380 °C were formed using digital light processing (DLP) 3D printing