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Publications in Math-Net.Ru |
Citations |
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2018 |
| 1. |
K. V. Feklistov, A. G. Cherkov, V. P. Popov, L. I. Fedina, “Redistribution of erbium and oxygen recoil atoms and the structure of silicon thin surface layers formed by high-dose argon implantation through Er and SiO$_{2}$ surface films”, Fizika i Tekhnika Poluprovodnikov, 52:13 (2018), 1589–1596   ; Semiconductors, 52:13 (2018), 1696–1703 |
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2015 |
| 2. |
K. V. Feklistov, D. S. Abramkin, V. I. Obodnikov, V. P. Popov, “Doping silicon with erbium by recoil implantation”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 41:16 (2015), 52–60 ; Tech. Phys. Lett., 41:8 (2015), 788–792 |
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