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Fizika i Tekhnika Poluprovodnikov, 2013, Volume 47, Issue 10, Pages 1421–1424
(Mi phts8051)
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This article is cited in 15 scientific papers (total in 15 papers)
Manufacturing, processing, testing of materials and structures
Optical properties of ITO films obtained by high-frequency magnetron sputtering with accompanying ion treatment
P. N. Krilov, R. M. Zakirova, I. V. Fedotova Udmurt State University, Izhevsk
Abstract:
A variation in the properties of indium-tin-oxide (ITO) films obtained by the method of reactive magnetron sputtering with simultaneous ion treatment is reported. The ITO films feature the following parameters in the optical range of 450–1100 nm: a transmission coefficient of 80%, band gap of 3.50–3.60 eV, and a refractive index of 1.97–2.06. All characteristics of the films depend on the ion-treatment current. The latter, during the course of deposition, reduces the resistivity of the ITO films with the smallest value of the resistivity being equal to 2 $\times$ 10$^{-3}$ $\Omega$ cm. The degradation of films with a high resistivity when kept in air is observed.
Received: 28.01.2013 Accepted: 04.02.2013
Citation:
P. N. Krilov, R. M. Zakirova, I. V. Fedotova, “Optical properties of ITO films obtained by high-frequency magnetron sputtering with accompanying ion treatment”, Fizika i Tekhnika Poluprovodnikov, 47:10 (2013), 1421–1424; Semiconductors, 47:10 (2013), 1412–1415
Linking options:
https://www.mathnet.ru/eng/phts8051 https://www.mathnet.ru/eng/phts/v47/i10/p1421
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