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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2015, Volume 41, Issue 19, Pages 55–63
(Mi pjtf7851)
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Modeling the deflection of relativistic electrons in a bent silicon crystal
V. P. Koshcheeva, Yu. N. Shtanovb, D. A. Morgunc, T. A. Paninac a Strela Branch of MAI, Zhukovsky, Moscow Region
b Surgut Institute of Oil and Gas, Tyumen State Oil and Gas University
c Surgut State University
Abstract:
The deflection of electrons with energies 855 MeV and 6.3 GeV in planar (111) channels of a bent silicon crystal has been numerically simulated using a TROPICS computer code with atomic diffusion coefficient constructed in the Doyle–Turner approximation of the isolated atom potential. It is established that the atomic diffusion coefficient tends to a minimum value in the region of maximum nuclear density of atomic chain, where the Kitagawa–Ohtsuki diffusion coefficient reaches a maximum value.
Received: 05.05.2015
Citation:
V. P. Koshcheev, Yu. N. Shtanov, D. A. Morgun, T. A. Panina, “Modeling the deflection of relativistic electrons in a bent silicon crystal”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 41:19 (2015), 55–63; Tech. Phys. Lett., 41:10 (2015), 946–949
Linking options:
https://www.mathnet.ru/eng/pjtf7851 https://www.mathnet.ru/eng/pjtf/v41/i19/p55
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