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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2015, Volume 41, Issue 19, Pages 55–63 (Mi pjtf7851)  

Modeling the deflection of relativistic electrons in a bent silicon crystal

V. P. Koshcheeva, Yu. N. Shtanovb, D. A. Morgunc, T. A. Paninac

a Strela Branch of MAI, Zhukovsky, Moscow Region
b Surgut Institute of Oil and Gas, Tyumen State Oil and Gas University
c Surgut State University
Abstract: The deflection of electrons with energies 855 MeV and 6.3 GeV in planar (111) channels of a bent silicon crystal has been numerically simulated using a TROPICS computer code with atomic diffusion coefficient constructed in the Doyle–Turner approximation of the isolated atom potential. It is established that the atomic diffusion coefficient tends to a minimum value in the region of maximum nuclear density of atomic chain, where the Kitagawa–Ohtsuki diffusion coefficient reaches a maximum value.
Received: 05.05.2015
English version:
Technical Physics Letters, 2015, Volume 41, Issue 10, Pages 946–949
DOI: https://doi.org/10.1134/S1063785015100089
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: V. P. Koshcheev, Yu. N. Shtanov, D. A. Morgun, T. A. Panina, “Modeling the deflection of relativistic electrons in a bent silicon crystal”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 41:19 (2015), 55–63; Tech. Phys. Lett., 41:10 (2015), 946–949
Citation in format AMSBIB
\Bibitem{KosShtMor15}
\by V.~P.~Koshcheev, Yu.~N.~Shtanov, D.~A.~Morgun, T.~A.~Panina
\paper Modeling the deflection of relativistic electrons in a bent silicon crystal
\jour Pisma v Zhurnal Tekhnicheskoi Fiziki
\yr 2015
\vol 41
\issue 19
\pages 55--63
\mathnet{http://mi.mathnet.ru/pjtf7851}
\elib{https://elibrary.ru/item.asp?id=24196539}
\transl
\jour Tech. Phys. Lett.
\yr 2015
\vol 41
\issue 10
\pages 946--949
\crossref{https://doi.org/10.1134/S1063785015100089}
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