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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2015, Volume 41, Issue 19, Pages 73–80
(Mi pjtf7853)
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Single-crystal GaN/AlN layers on CVD diamond
O. I. Khrykina, Yu. N. Drozdova, M. N. Drozdova, P. A. Yuninab, V. I. Shashkina, S. A. Bogdanovc, A. B. Muchnikovc, A. L. Vikharevc, D. B. Radishevc a Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhnii Novgorod
b National Research Lobachevsky State University of Nizhny Novgorod
c Institute of Applied Physics, Russian Academy of Sciences, Nizhny Novgorod, 603950, Russia
Abstract:
Original approach to fabricating a GaN/AlN/nanocrystalline diamond structure has been suggested and implemented. The stages of deposition of a structure of this kind include the following: (a) growth of nanocrystalline CVD-diamond on single-crystal AlN (preliminarily grown on a silicon substrate), (b) etch removal of the silicon substrate, and (c) growth of single-crystal GaN on the surface of single-crystal AlN. Single-crystal gallium nitride with a width of the X-ray rocking curve for the (0002) reflection of 0.35$^\circ$ was obtained on a nanocrystalline-diamond substrate.
Received: 05.05.2015
Citation:
O. I. Khrykin, Yu. N. Drozdov, M. N. Drozdov, P. A. Yunin, V. I. Shashkin, S. A. Bogdanov, A. B. Muchnikov, A. L. Vikharev, D. B. Radishev, “Single-crystal GaN/AlN layers on CVD diamond”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 41:19 (2015), 73–80; Tech. Phys. Lett., 41:10 (2015), 954–956
Linking options:
https://www.mathnet.ru/eng/pjtf7853 https://www.mathnet.ru/eng/pjtf/v41/i19/p73
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