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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2015, Volume 41, Issue 22, Pages 55–60 (Mi pjtf7893)  
This article is cited in 39 scientific papers (total in 39 papers)

Raman spectroscopy of copper oxide films deposited by reactive magnetron sputtering

V. S. Levitskii, V. I. Shapovalov, A. E. Komlev, A. V. Zav’yalov, V. V. Vit'ko, A. A. Komlev, E. S. Shutova

Saint Petersburg Electrotechnical University "LETI"
Full-text PDF (310 kB) Citations (39)
Abstract: Raman spectroscopy has been used to study the influence of partial oxygen pressure during deposition and isothermal treatment on the chemical composition of copper oxide films deposited by reactive dc magnetron sputtering of copper target in a reactive gaseous medium. Three series of films deposited at various partial oxygen pressures (from 0.06 to 0.16 mTorr) possessed different chemical compositions. The subsequent thermal treatment of all samples was performed for 30 min in air at a constant temperature in a 300–500$^\circ$C interval. An increase in the annealing temperature led to chemical changes in the films. After isothermal treatment at 450$^\circ$C, the films in all series acquired stoichiometric CuO composition.
Received: 02.06.2015
English version:
Technical Physics Letters, 2015, Volume 41, Issue 11, Pages 1094–1096
DOI: https://doi.org/10.1134/S106378501511022X
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: V. S. Levitskii, V. I. Shapovalov, A. E. Komlev, A. V. Zav’yalov, V. V. Vit'ko, A. A. Komlev, E. S. Shutova, “Raman spectroscopy of copper oxide films deposited by reactive magnetron sputtering”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 41:22 (2015), 55–60; Tech. Phys. Lett., 41:11 (2015), 1094–1096
Citation in format AMSBIB
\Bibitem{LevShaKom15}
\by V.~S.~Levitskii, V.~I.~Shapovalov, A.~E.~Komlev, A.~V.~Zav’yalov, V.~V.~Vit'ko, A.~A.~Komlev, E.~S.~Shutova
\paper Raman spectroscopy of copper oxide films deposited by reactive magnetron sputtering
\jour Pisma v Zhurnal Tekhnicheskoi Fiziki
\yr 2015
\vol 41
\issue 22
\pages 55--60
\mathnet{http://mi.mathnet.ru/pjtf7893}
\elib{https://elibrary.ru/item.asp?id=24196595}
\transl
\jour Tech. Phys. Lett.
\yr 2015
\vol 41
\issue 11
\pages 1094--1096
\crossref{https://doi.org/10.1134/S106378501511022X}
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    • This publication is cited in the following 39 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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