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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2014, Volume 40, Issue 4, Pages 1–8
(Mi pjtf8076)
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This article is cited in 2 scientific papers (total in 2 papers)
Modification of the structure and hydrogen content of amorphous hydrogenated silicon films under conditions of femtosecond laser-induced crystallization
A. V. Emelyanovabcd, A. G. Kazanskiiabcd, P. K. Kashkarovabcd, O. I. Kon'kovabcd, N. P. Kutuzovabcd, V. L. Lyaskovskiiabcd, P. A. Forshabcd, M. V. Khenkinabcd a Lomonosov Moscow State University
b National Research Centre "Kurchatov Institute", Moscow
c Ioffe Institute, St. Petersburg
d The All Russian Scientific-Research Institute for Optic Physical Metrology of Government Standard, Moscow
Abstract:
We have studied the Raman spectra of initially amorphous hydrogenated silicon (a-Si:H) films upon their exposure to femtosecond laser-radiation pulses with the fluence varied within 30–155 mJ/cm$^2$. The distribution of the volume fraction of a crystalline phase over the surface of processed films is determined for the first time and a correlation is established between changes in this value and the hydrogen content in a-Si:H films upon the crystallization induced by femtosecond laser radiation.
Received: 03.10.2013
Citation:
A. V. Emelyanov, A. G. Kazanskii, P. K. Kashkarov, O. I. Kon'kov, N. P. Kutuzov, V. L. Lyaskovskii, P. A. Forsh, M. V. Khenkin, “Modification of the structure and hydrogen content of amorphous hydrogenated silicon films under conditions of femtosecond laser-induced crystallization”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 40:4 (2014), 1–8; Tech. Phys. Lett., 40:2 (2014), 141–144
Linking options:
https://www.mathnet.ru/eng/pjtf8076 https://www.mathnet.ru/eng/pjtf/v40/i4/p1
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