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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2014, Volume 40, Issue 7, Pages 8–15 (Mi pjtf8115)  
This article is cited in 4 scientific papers (total in 4 papers)

Formation of carbon subnanosize masking coatings on silicon (100) in low-pressure microwave plasma

R. K. Yafarov, V. Ya. Shanygin

Saratov Branch, Kotel'nikov Institute of Radio-Engineering and Electronics, Russian Academy of Sciences
Full-text PDF (601 kB) Citations (4)
Abstract: Self-organization of nanosize domains in deposition of submonolayer carbon coatings on silicon (100) in a low-pressure microwave plasma has been revealed by scanning atomic-force and electron microscopy. It is shown that the nanosize carbon-containing domains can be used as masking coatings to obtain 3D low-dimensional systems on single-crystal silicon (100) by highly anisotropic plasma-chemical etching.
Received: 01.11.2013
English version:
Technical Physics Letters, 2014, Volume 40, Issue 4, Pages 280–283
DOI: https://doi.org/10.1134/S1063785014040130
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: R. K. Yafarov, V. Ya. Shanygin, “Formation of carbon subnanosize masking coatings on silicon (100) in low-pressure microwave plasma”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 40:7 (2014), 8–15; Tech. Phys. Lett., 40:4 (2014), 280–283
Citation in format AMSBIB
\Bibitem{YafSha14}
\by R.~K.~Yafarov, V.~Ya.~Shanygin
\paper Formation of carbon subnanosize masking coatings on silicon (100) in low-pressure microwave plasma
\jour Pisma v Zhurnal Tekhnicheskoi Fiziki
\yr 2014
\vol 40
\issue 7
\pages 8--15
\mathnet{http://mi.mathnet.ru/pjtf8115}
\elib{https://elibrary.ru/item.asp?id=21311126}
\transl
\jour Tech. Phys. Lett.
\yr 2014
\vol 40
\issue 4
\pages 280--283
\crossref{https://doi.org/10.1134/S1063785014040130}
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    • This publication is cited in the following 4 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
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