Pisma v Zhurnal Tekhnicheskoi Fiziki
RUS  ENG    JOURNALS   PEOPLE   ORGANISATIONS   CONFERENCES   SEMINARS   VIDEO LIBRARY   PACKAGE AMSBIB  
General information
Latest issue
Archive
Guidelines for authors

Search papers
Search references

RSS
Latest issue
Current issues
Archive issues
What is RSS


Pisma v Zhurnal Tekhnicheskoi Fiziki:
Year:
Volume:
Issue:
Page:
Find




Personal entry:
Login:
Password:
Save password
Enter
Forgotten password?
Register

Pisma v Zhurnal Tekhnicheskoi Fiziki, 2014, Volume 40, Issue 15, Pages 30–37 (Mi pjtf8218)  
This article is cited in 6 scientific papers (total in 6 papers)

Epitaxy of Pb(Zr,Ti)O$_3$ films on Ir/YSZ/Si under conditions of cathode sputtering: The effect of reactive gas composition

V. G. Beshenkov, A. A. Burlakov, A. G. Znamenskii, V. A. Marchenko

Institute of Microelectronics Technology and High-Purity Materials RAS
Full-text PDF (332 kB) Citations (6)
Abstract: The peculiarities of the growth of PZT films on heteroepitaxial Ir/YSZ/Si structures under conditions of cathode radio-frequency sputtering of a ceramic target in argon-oxygen mixtures have been studied. It is shown that sputtering in a gas mixture with a high partial pressure of oxygen results in crystallization of the PZT films in a metastable pyrochlore structure, while sputtering in argon or the use of argon in the initial phase of the sputtering yields PZT films with an equilibrium perovskite structure.
Received: 13.03.2014
English version:
Technical Physics Letters, 2014, Volume 40, Issue 8, Pages 644–647
DOI: https://doi.org/10.1134/S1063785014080045
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: V. G. Beshenkov, A. A. Burlakov, A. G. Znamenskii, V. A. Marchenko, “Epitaxy of Pb(Zr,Ti)O$_3$ films on Ir/YSZ/Si under conditions of cathode sputtering: The effect of reactive gas composition”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 40:15 (2014), 30–37; Tech. Phys. Lett., 40:8 (2014), 644–647
Citation in format AMSBIB
\Bibitem{BesBurZna14}
\by V.~G.~Beshenkov, A.~A.~Burlakov, A.~G.~Znamenskii, V.~A.~Marchenko
\paper Epitaxy of Pb(Zr,Ti)O$_3$ films on Ir/YSZ/Si under conditions of cathode sputtering: The effect of reactive gas composition
\jour Pisma v Zhurnal Tekhnicheskoi Fiziki
\yr 2014
\vol 40
\issue 15
\pages 30--37
\mathnet{http://mi.mathnet.ru/pjtf8218}
\elib{https://elibrary.ru/item.asp?id=22019612}
\transl
\jour Tech. Phys. Lett.
\yr 2014
\vol 40
\issue 8
\pages 644--647
\crossref{https://doi.org/10.1134/S1063785014080045}
Linking options:
  • https://www.mathnet.ru/eng/pjtf8218
  • https://www.mathnet.ru/eng/pjtf/v40/i15/p30
    • This publication is cited in the following 6 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    		Pisma v Zhurnal Tekhnicheskoi Fiziki Pisma v Zhurnal Tekhnicheskoi Fiziki
     
      Contact us:
    		  Terms of Use  Registration to the website  Logotypes © Steklov Mathematical Institute RAS, 2025