|
|
Pisma v Zhurnal Tekhnicheskoi Fiziki, 2014, Volume 40, Issue 21, Pages 104–110
(Mi pjtf8311)
|
|
|
|
This article is cited in 2 scientific papers (total in 2 papers)
Spatial oscillations of the electric field and the charge density in a silicon $p$–$i$–$n$ diode
D. A. Usanov, S. S. Gorbatov, V. Yu. Kvasko, A. V. Fadeev, A. A. Kalyamin Saratov State University
Abstract:
The distributions of the electrical field and the charge density in a $p$–$i$–$n$ diode under forward bias were calculated numerically and studied experimentally with the use of a near-field microwave microscope. The crucial importance of including the dependence of the carrier diffusion coefficient on the electric field into the description of processes taking place in $p$–$i$–$n$ diodes was demonstrated. The numerical results agree qualitatively with the experimental ones.
Received: 16.06.2014
Citation:
D. A. Usanov, S. S. Gorbatov, V. Yu. Kvasko, A. V. Fadeev, A. A. Kalyamin, “Spatial oscillations of the electric field and the charge density in a silicon $p$–$i$–$n$ diode”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 40:21 (2014), 104–110; Tech. Phys. Lett., 40:11 (2014), 984–986
Linking options:
https://www.mathnet.ru/eng/pjtf8311 https://www.mathnet.ru/eng/pjtf/v40/i21/p104
|
|