The formation of the (200) and (110) textures in iron films prepared by magnetron sputtering

The effect of working-gas pressure on the texture of iron films on Si(100)/SiO$_2$ substrates prepared by magnetron sputtering at room temperature is studied. It is shown that a change in working-gas pressure from 1.33 to 0.09 Pa leads to a change in the texture of the films from (110) to (200), which is accompanied by transition from a columnar to quasi-homogeneous microstructure of the films. It is found that the surface roughness of the film nonmonotonically depends on working-gas pressure and has a maximum in a pressure range corresponding to the coexistence of phases with the (110) and (200) textures in the film.