|
|
Pisma v Zhurnal Tekhnicheskoi Fiziki, 2012, Volume 38, Issue 5, Pages 49–55
(Mi pjtf8787)
|
|
|
|
This article is cited in 4 scientific papers (total in 4 papers)
Mask for micropattern formation on diamond films
M. E. Belousovab, E. A. Il'ichevab, A. E. Kuleshovab, N. K. Matveevaab, P. V. Minakovab, G. N. Petrukhinab, R. M. Nabievab, G. S. Rychkovab a State Research Institute of Physical Problems
b Lomonosov Moscow State University, Skobeltsyn Institute of Nuclear Physics
Abstract:
A new technology of forming micropatterned masks for the etching of diamond films is proposed, which makes possible high-precision lithography on the samples with areas up to 10$^4$ mm$^2$. A minimum element size that can be achieved is only determined by the level of lithography accessible for silicon-based integrated circuits. The proposed technology can be used in creating unique devices, including biosensor chips for human genome decoding.
Received: 21.06.2011
Citation:
M. E. Belousov, E. A. Il'ichev, A. E. Kuleshov, N. K. Matveeva, P. V. Minakov, G. N. Petrukhin, R. M. Nabiev, G. S. Rychkov, “Mask for micropattern formation on diamond films”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 38:5 (2012), 49–55; Tech. Phys. Lett., 38:3 (2012), 225–227
Linking options:
https://www.mathnet.ru/eng/pjtf8787 https://www.mathnet.ru/eng/pjtf/v38/i5/p49
|
|