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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2012, Volume 38, Issue 5, Pages 71–77
(Mi pjtf8790)
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This article is cited in 1 scientific paper (total in 1 paper)
Effect of phosphorus ion implantation on the optical properties of thin films of germanium dioxide doped with Er$^{3+}$ and Yb$^{3+}$ ions
I. N. Antonov, O. N. Gorshkov, A. N. Shushonov, A. P. Kasatkin, A. Yu. Dudin, M. E. Shenina Scientific-Research Physicotechnical Institute at the Nizhnii Novgorod State University, Nizhnii Novgorod
Abstract:
It is shown that the ion implantation of phosphorus into thin amorphous films of germanium dioxide doped with Er$^{3+}$ and Yb$^{3+}$ ions can be used for enhancing luminescence from Er$^{3+}$ ions at $\sim$1.53 $\mu$m.
Received: 18.07.2011
Citation:
I. N. Antonov, O. N. Gorshkov, A. N. Shushonov, A. P. Kasatkin, A. Yu. Dudin, M. E. Shenina, “Effect of phosphorus ion implantation on the optical properties of thin films of germanium dioxide doped with Er$^{3+}$ and Yb$^{3+}$ ions”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 38:5 (2012), 71–77; Tech. Phys. Lett., 38:3 (2012), 235–237
Linking options:
https://www.mathnet.ru/eng/pjtf8790 https://www.mathnet.ru/eng/pjtf/v38/i5/p71
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