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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2012, Volume 38, Issue 6, Pages 90–95
(Mi pjtf8808)
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This article is cited in 14 scientific papers (total in 14 papers)
Group-III-nitride-based light-emitting diode on silicon substrate with epitaxial nanolayer of silicon carbide
S. A. Kukushkinab, A. V. Osipovab, S. G. Zhukovab, E. E. Zavarinab, V. V. Lundinab, M. A. Sinicinab, M. M. Rozhavskayaab, A. F. Tsatsul'nikovab, S. I. Troshkovab, N. A. Feoktistovab a Institute of Problems of Mechanical Engineering, Russian Academy of Sciences, St. Petersburg
b Ioffe Institute, St. Petersburg
Abstract:
A light-emitting diode (LED) structure based on group III nitride has been grown for the first time on Si(111) substrate with SiC buffer nanolayer (50- to 200-nm-thick) obtained by solid-phase epitaxy. This LED structure is characterized by record low ($<$ 10$^8$ cm$^{-2}$) density of lattice misfit dislocations at a total dislocation density of $\sim$8 $\times$ 10$^8$ cm$^{-2}$. The photo- and electroluminescence spectra of obtained structures have been measured.
Received: 15.11.2011
Citation:
S. A. Kukushkin, A. V. Osipov, S. G. Zhukov, E. E. Zavarin, V. V. Lundin, M. A. Sinicin, M. M. Rozhavskaya, A. F. Tsatsul'nikov, S. I. Troshkov, N. A. Feoktistov, “Group-III-nitride-based light-emitting diode on silicon substrate with epitaxial nanolayer of silicon carbide”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 38:6 (2012), 90–95; Tech. Phys. Lett., 38:3 (2012), 297–299
Linking options:
https://www.mathnet.ru/eng/pjtf8808 https://www.mathnet.ru/eng/pjtf/v38/i6/p90
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