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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2012, Volume 38, Issue 16, Pages 87–94
(Mi pjtf8937)
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This article is cited in 4 scientific papers (total in 4 papers)
Thin magnetite films on an oxidized silicon surface: Raman spectroscopy study
V. A. Vikulovab, V. V. Balashevab, T. A. Pisarenkoab, A. A. Dmitrievab, V. V. Korobtsovab a Institute for Automation and Control Processes, Far Eastern Branch of the Russian Academy of Sciences, Vladivostok
b School of Natural Sciences, Far Eastern Federal University, Vladivostok
Abstract:
Polycrystalline films of magnetite (Fe$_3$O$_4$) formed by the reactive sputtering of iron in oxygen on Si(001) substrates covered by thin (1.4 nm) or thick (1200 nm) SiO$_2$ layers have been studied by Raman spectroscopy. It is established that (i) the $\alpha$-Fe$_2$O$_3$ phase is formed due to the laser-induced heating in magnetite films synthesized on thick SiO$_2$ layers and (ii) the formation of $\alpha$-Fe$_2$O$_3$ phase depends on the thickness of the buffer SiO$_2$ layer.
Received: 14.03.2012
Citation:
V. A. Vikulov, V. V. Balashev, T. A. Pisarenko, A. A. Dmitriev, V. V. Korobtsov, “Thin magnetite films on an oxidized silicon surface: Raman spectroscopy study”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 38:16 (2012), 87–94; Tech. Phys. Lett., 38:8 (2012), 772–775
Linking options:
https://www.mathnet.ru/eng/pjtf8937 https://www.mathnet.ru/eng/pjtf/v38/i16/p87
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