The threshold of nanopore formation in ion-implanted platinum

The method of field-ion microscopy was used to determine the threshold of nanopore formation in ion-implanted platinum. The threshold for ion-implanted platinum corresponds to fluence $F$ = 10$^{17}$ ions/cm$^2$. The size of nanopores is determined: 1–5 nm (transverse) and 1–9 nm (lateral, across the target depth). It is found that up to 40% of nanopores are located in the subsurface layer with a thickness of 10 nm. The obtained results can be used for prediction of radiation stability of materials based on fcc metals.