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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2012, Volume 38, Issue 21, Pages 13–21
(Mi pjtf8991)
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This article is cited in 3 scientific papers (total in 3 papers)
Signal amplification under stochastic resonance in vanadium dioxide film
V. Sh. Aliev, S. G. Bortnikov, M. A. Dem'yanenko Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences, Novosibirsk
Abstract:
The phenomenon of stochastic resonance with an input signal gain of 1.6 times was observed in the planar structure that is connected in series with the loading resistor and has a VO$_2$ conducting channel. It was shown that the signal-to-noise ratio transferring in the circuit can reach 250 times.
Received: 18.04.2012
Citation:
V. Sh. Aliev, S. G. Bortnikov, M. A. Dem'yanenko, “Signal amplification under stochastic resonance in vanadium dioxide film”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 38:21 (2012), 13–21; Tech. Phys. Lett., 38:11 (2012), 965–968
Linking options:
https://www.mathnet.ru/eng/pjtf8991 https://www.mathnet.ru/eng/pjtf/v38/i21/p13
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