Condensation of an argon–monosilane mixture in a free jet

A mass–spectrometric study of the condensation of pure Ar and a 5% SiH$_4$ + 95% Ar mixture in a supersonic pulse free jet in a broad interval of stagnation pressures is performed. It is shown that a small content of monosilane in argon leads to the fact that condensation in the mixture begins at lower stagnation pressures than in pure argon; at high stagnation pressures, mixed argon–silane complexes are formed in the flow. The sequence of the stages of cluster formation in the mixture is determined.