Forming micro and nanostructures using impulse laser influence

In this work the experiments for forming micro and nanostructures on solid surfaces using impulse laser evaporation are performed. This method was designed for modification of the ion implanted glasses. Ni and Co films with a thickness of 20–30 nm were grown on quartz glass and then micro-junction was made under impulse laser evaporation. These structures are suitable for nano-contact formation which is the main magneto-resistant unit of spintronics. The film thickness and the micro-junction width were measured with high precision using atomic-force microscopes (AFM). Also nanoparticles formed on a substrate under impulse laser evaporation were visualized with AFM. To estimate particle size distribution the special computer algorithm was applied.